Tetramethylammonium Hydroxide, 25% w/w Solution, 1 L

Product Overview

Tetramethylammonium hydroxide (TMAH or TMAOH) is a quaternary ammonium compound with the molecular formula N(CH₃)₄⁺ OH⁻. This 25% w/w aqueous solution is colorless to slightly yellow and commonly contains trace levels of trimethylamine, which may impart a faint fishy odor. TMAH plays a critical role in multiple high-tech and research environments.

In semiconductor fabrication, TMAH is widely employed for anisotropic silicon etching and as a developer for photoresists in photolithography. Its strong base properties make it a potent photoresist stripper. TMAH also serves as a surfactant in ferrofluid synthesis, an inhibitor of nanoparticle aggregation, and exhibits phase-transfer catalyst behavior. Additionally, it is one of the most common reagents used in thermochemolysis, a hybrid analytical method combining pyrolysis and chemical derivatization.

Key Industries

• Semiconductor & Microelectronics – Etching and photoresist development in photolithography processes
• Nanotechnology & Materials Science – Synthesis of ferrofluids, nanoparticle dispersion control, and surface functionalization
• Analytical Chemistry – Used in thermochemolysis and derivatization workflows
• Research & Academia – Supports advanced chemical and materials research in catalysis and surface modification
• Chemical Manufacturing – Phase transfer catalyst and specialty reagent applications

Packaging Options

This product is available in a variety of packaging sizes to meet both small-scale laboratory and large-scale industrial needs. Custom volumes and container types are available upon request, ensuring flexibility for your application and storage requirements.