Hydrofluoric Acid – CAS 7664-39-3

Product Overview

Hydrofluoric acid (HF) at a concentration of approximately 49% (32.1 N) is a highly corrosive and toxic solution. It is widely utilized in industrial processes for its unique ability to dissolve silica-based materials, notably glass and quartz. Its potent etching capabilities are critical in electronics, semiconductor manufacturing, and various chemical synthesis processes. Due to its extreme health risks, including severe skin burns and systemic fluoride poisoning, hydrofluoric acid requires stringent handling protocols and specialized protective equipment.

Key Industries

• Chemical Manufacturing – Essential reagent in synthesis of fluorochemicals and pharmaceuticals
• Electronics & Semiconductors – Used in wafer cleaning, etching, and manufacturing processes
• Glass & Ceramics – Critical for precise glass etching, frosting, and surface treatment
• Metallurgy & Metal Processing – Rust removal, surface cleaning, and preparation of metals
• Petroleum & Petrochemicals – Alkylation processes and catalyst regeneration
• Laboratory & Research – Analytical applications, sample digestion, and chemical preparations
• Mining & Mineral Processing – Extraction and purification of certain ores and minerals
• Water Treatment – Industrial cleaning and removal of silica deposits
• Agriculture – Manufacturing fluorine-containing agrochemicals and fertilizers
• Pharmaceutical & Biotechnology – Specialty chemical synthesis and precision cleaning processes

Packaging Options

This product is available in a variety of packaging sizes to meet both small-scale laboratory and large-scale industrial needs. Custom volumes and container types are available upon request, ensuring flexibility for your application and storage requirements.